Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering

摘要

Transparent conducting ZnO:Al thin films have been deposited on polyester (Mylar type D, 100μm thickness) substrates at room temperature by r.f. magnetron sputtering. The structural, Optical and electrical properties of the deposited films have been studied. The samples are Polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-zxis orientation (002) perpendicular to the substrate surface. As deposited ZnO:Al thin films have an 85/100 transmittance in the visible and infra-red region and a resistivity as low as 3.6×10~2 Ωcm.