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Characterization of the Pyrolysis Process and Structure of Silicon Oxycarbide Based Materials from Organically Modified Silicate Gels

机译:有机改性硅酸盐凝胶对碳氧化硅基材料的热解过程和结构的表征

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Organically modified silicates (Ormosils) appear as precursors to prepare silicon oxycarbide based materials. These Ormosils were prepared from tetraethoxysilane (TEOS), silanol terminated polydimethylsiloxane (PDMS) and fumed silica, in different ratios by using the sol-gel method, and then pyrolysed in nitrogen atmosphere up to 1500 ℃ in order to obtain silicon oxycarbide materials. It was found that Ormosils are thermally stable in these conditions up to approximately 400 ℃. The transition between the hybrid material and the inorganic material occurs between approximately 600 and 1000 ℃. At 1000 ℃, silicon oxycarbide network is formed by [C_2SiO_2], [CSiO_3] and [SiO_4] sites and a polyaromatic free carbon phase. As the pyrolysis temperature increases, the amorphous silicon oxycarbide network and free carbon phase undergo structural rearrangements. At temperatures of 1400 and 1500 ℃, the network of pyrolysed materials is formed mainly by [SiC_4] and [SiO_4] sites and a nanocrystalline graphite-like phase.
机译:有机改性的硅酸盐(Ormosils)作为制备碳氧化硅基材料的前体出现。这些Ormosil由四乙氧基硅烷(TEOS),硅烷醇封端的聚二甲基硅氧烷(PDMS)和气相二氧化硅通过溶胶-凝胶法以不同的比例制备,然后在氮气氛中热解至1500℃,以获得碳氧化硅材料。发现在这些条件下,Ormosils在高达约400℃的条件下具有热稳定性。杂化材料和无机材料之间的转变发生在大约600到1000℃之间。在1000℃下,由[C_2SiO_2],[CSiO_3]和[SiO_4]位和多芳族自由碳相形成碳氧化硅网络。随着热解温度的升高,非晶碳氧化硅网络和自由碳相会发生结构重排。在1400和1500℃的温度下,热解材料的网络主要由[SiC_4]和[SiO_4]位以及纳米晶状的石墨相形成。

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