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首页> 外文期刊>Key Engineering Materials >The Role of Surface Physical Properties on Blood Compatibility of Titanium Oxide Films Synthesized by Unbalanced Magnetron Sputtering
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The Role of Surface Physical Properties on Blood Compatibility of Titanium Oxide Films Synthesized by Unbalanced Magnetron Sputtering

机译:表面物理性质对不平衡磁控溅射合成二氧化钛薄膜血液相容性的影响

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摘要

Surface modification has shown great potential for improving the hemocompatibility of biomedical materials and devices. In this paper we describe our work on improving blood compatibility with Ti-O thin films prepared by unbalanced DC magnetron sputtering. The structure and surface chemical and physical properties of the films were characterized by X-ray diffraction, X-ray photoelectron spectroscopy (XPS), SEM, sheet resistance tests, and Hall effect measurements. The sheet resistance of the titanium oxide samples increased with oxygen pressure and shows a sharp increase when only TiO_2 exists in the films. The band gap, carrier density and sheet resistance of the titanium oxide films synthesized at different oxygen pressure are different. These properties affect blood compatibility significantly. We suggest that the semiconducting nature of n-type Ti-O films with bandgap 3.0~3.2 eV, sheet resistance greater than 1 Ω.cm and carrier density of about 1.17 x 10~(16)cm~(-2) leads to their excellent blood compatibility.
机译:表面修饰已显示出巨大的潜力,可以改善生物医学材料和装置的血液相容性。在本文中,我们描述了我们通过不平衡直流磁控溅射制备的Ti-O薄膜改善血液相容性的工作。通过X射线衍射,X射线光电子能谱(XPS),SEM,薄层电阻测试和霍尔效应测量来表征薄膜的结构,表面化学和物理性质。氧化钛样品的薄层电阻随氧气压力的增加而增加,当薄膜中仅存在TiO_2时,其表面电阻急剧增加。在不同的氧气压力下合成的氧化钛薄膜的带隙,载流子密度和薄膜电阻均不同。这些性质显着影响血液相容性。我们认为带隙3.0〜3.2 eV,薄层电阻大于1Ω.cm,载流子密度约为1.17 x 10〜(16)cm〜(-2)的n型Ti-O薄膜具有半导体性质。极好的血液相容性。

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