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An Electrical Method for Measuring Fatigue and Tensile Properties of Thin Films on Substrates

机译:一种测量基板上薄膜疲劳和拉伸性能的电学方法

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摘要

A novel approach for measuring thermal fatigue lifetime and ultimate strength of patterned thin films on substrates is presented. The method is based on controlled application of cyclic joule heating by means of low-frequency, high-density alternating current. Such conditions preclude electromigration, but cause cyclic strains due to mismatch in coefficients of thermal expansion between film and substrate. Strain and stress are determined from measurement of temperature. Fatigue properties are a natural fit to testing by alternating current. Stress-lifetime (S-N) data were obtained from patterned aluminum lines, where stress amplitude was varied by changing current density, and lifetimes were defined by open circuit failure. Electron microscopy and electron backscatter diffraction observations of damage induced by a.c. testing suggested that deformation took place by dislocation mechanisms. We also observed rapid growth of grains - the mean diameter increased by more than 70% after a cycling time of less than six minutes - which we attribute to strain-induced boundary migration. Ultimate strength was determined by extrapolating a modified Basquin relation for high cycle data to a single load reversal. A strength estimate of 250 ± 40 MPa was determined based on a.c. thermal fatigue data. In principle, an electrical approach allows for testing of patterned films of any dimension, provided electrical access is available. Furthermore, structures buried beneath other layers of materials can be tested.
机译:提出了一种新的方法来测量热疲劳寿命和基板上图案化薄膜的极限强度。该方法基于通过低频,高密度交流电对循环焦耳加热的控制应用。这样的条件阻止了电迁移,但是由于膜和基板之间的热膨胀系数的不匹配而导致循环应变。应变和应力由温度测量确定。疲劳特性很自然地适合通过交流电进行测试。应力寿命(S-N)数据是从有图案的铝线获得的,其中,通过改变电流密度来改变应力幅度,并且通过断路故障来定义寿命。电子显微镜和电子背散射衍射观察到的交流电引起的损伤测试表明变形是由位错机制引起的。我们还观察到晶粒快速生长-循环时间少于6分钟后,平均直径增加了70%以上-我们将其归因于应变引起的边界迁移。通过将高循环数据的修改后的Basquin关系外推到单次载荷反转来确定极限强度。根据交流电确定强度估计值为250±40 MPa。热疲劳数据。原则上,只要有电气通路,电气方法就可以测试任何尺寸的图案化薄膜。此外,可以测试掩埋在其他材料层之下的结构。

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