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Investigation of Electron Traps in SnO_2 Based Varistor Ceramics

机译:SnO_2基压敏陶瓷中电子陷阱的研究

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摘要

Dense tin oxide based ceramics are a new type of varistor materials. To further understand the electrical properties of SnO_2 varistors doped with CoO, Nb_2O_5, and Cr_2O_3, the techniques of capacitance-voltage (C-V) measurement and deep level transient spectroscopy (DLTS) were used to investigate the electron traps in the SCN samples (doped with 1.0 mol% CoO and 0.05mol% Nb_2O_5) and SCNCr samples (doped with 1.0 mol% CoO, 0.05mol% Nb_2O_5 and 0.05mol% Cr_2O_3). Two electron traps were detected: trap T1 is located at E_c- 0.30 ± 0.01eV and trap T2 is located at E_c - 0.69 ± 0.03eV for both SCN and SCNCr samples. The variations in the donor density and trap density could be related to the addition of chromium oxide. The features of these traps are discussed based on the defect theory related to the SnO_2 varistors.
机译:致密的氧化锡基陶瓷是新型的压敏电阻材料。为了进一步了解掺有CoO,Nb_2O_5和Cr_2O_3的SnO_2压敏电阻的电性能,使用电容电压(CV)测量和深能级瞬态光谱(DLTS)技术研究了SCN样品(掺杂有Cn)中的电子陷阱。 1.0 mol%CoO和0.05mol%Nb_2O_5)和SCNCr样品(掺有1.0 mol%CoO,0.05mol%Nb_2O_5和0.05mol%Cr_2O_3)。检测到两个电子陷阱:对于SCN和SCNCr样品,陷阱T1位于E_c- 0.30±0.01eV,陷阱T2位于E_c-0.69±0.03eV。供体密度和阱密度的变化可能与氧化铬的添加有关。基于与SnO_2压敏电阻有关的缺陷理论,讨论了这些陷阱的特征。

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