Lift-off And Hybrid Applications With Ma-n 1405 Negative-tone Resist

摘要

The authors evaluated the performance of the negative-tone resist ma-n 1405 for lift-off and hybrid processes by combining electron-beam and/or laser lithography techniques with metal deposition. Electron lithography and gold deposition allow the fabrication of useful structures such as circles, lines, and coaxes with a resolution of nearly 70 nm. The ability of this resist to withstand a hybrid process was also tested. A constricted line was transferred to the silicon substrate by lift-off, where the large (1 μm linewidth) and the small (200 nm linewidth) features were, respectively, patterned by laser and electron-beam direct writing on a single resist level.