首页> 外文期刊>Journal of Vacuum Science & Technology >Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography
【24h】

Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography

机译:制作具有微和纳米图案表面浮雕的台面,用作步进和印记平版印刷术的工作印章

获取原文
获取原文并翻译 | 示例

摘要

A manufacturing concept to fabricate working stamps with defined mesa structures using combined nanoimprint and photolithography is presented. OrmoStamp, an UV-curable organic-inorganic hybrid polymer, was used as mold material. 30 μm high large mesa structures (4×4 mm~2) with sharp borders and almost vertical sidewalls were manufactured. On top they featured nanograting patterns with 200 nm height and lateral size as a surface relief. The good thermal decoupling of stamp body and imprinted substrate and the high planarity (divergence <50 nm) make the stamp very suitable for thermal step and repeat nanoimprint lithography of confined patterns with low stitching errors. Up to 210 imprints were performed with a single mesa into a 325 nm thin layer of mr-I 7030E.
机译:提出了使用组合的纳米压印和光刻技术制造具有定义的台面结构的工作印模的制造概念。紫外线可固化的有机-无机杂化聚合物OrmoStamp被用作模具材料。制作了30μm高大台面结构(4×4 mm〜2),具有清晰的边框和几乎垂直的侧壁。最重要的是,它们具有纳米光栅图案,具有200 nm的高度和横向尺寸作为表面浮雕。压模主体和压印衬底的良好热解耦以及高平面度(发散度<50 nm)使压模非常适合热步进和重复缝制误差低的受限图案的纳米压印光刻。用单个台面在325 nm的MR-1 7030E薄层中进行多达210个印记。

著录项

  • 来源
    《Journal of Vacuum Science & Technology》 |2010年第6期|p.C6M37-C6M40|共4页
  • 作者单位

    Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland;

    Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland;

    VTTInformation Technology, 02044 VTT, Finland;

    Micro Resist Technology GmbH, Koepenicker Str. 325, 12555 Berlin, Germany;

    Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号