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首页> 外文期刊>Journal of Vacuum Science & Technology >Investigation of multistack InAs/InGaAs/GaAs self-assembled quantum dots-in-double-well structures for infrared detectors
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Investigation of multistack InAs/InGaAs/GaAs self-assembled quantum dots-in-double-well structures for infrared detectors

机译:用于红外探测器的多堆叠InAs / InGaAs / GaAs自组装量子点双阱结构研究

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摘要

The authors report the InAs/InGaAs/GaAs/AlGaAs quantum dots-in-double-well (D-DWELL) design, which has a lower strain per DWELL stack than the InAs/InGaAs/GaAs DWELLs thereby enabling the growth of many more stacks in the detector. The purpose of this study is to examine the effects of varying the number of stacks in the double DWELL detector on its device performance. The structures are grown by solid source molecular beam epitaxy on GaAs substrates. After fabrication of single pixel devices, a series of device measurements such as spectral response, dark current, total current, and responsivity were undertaken and the photoconductive gain and the activation energies were extracted. The goal of these experiments is not only to optimize the device performance by optimizing the number of stacks but also to investigate the transport properties as a function of the number of stacks.
机译:作者报告了InAs / InGaAs / GaAs / AlGaAs双阱量子点(D-DWELL)设计,该设计的每个DWELL堆栈的应变低于InAs / InGaAs / GaAs DWELL的应变,从而能够生长更多的堆栈在探测器中。本研究的目的是研究改变双DWELL检测器中的堆叠数量对其设备性能的影响。通过固体源分子束外延在GaAs衬底上生长结构。在制造单个像素器件之后,进行了一系列器件测量,例如光谱响应,暗电流,总电流和响应度,并提取了光电导增益和激活能。这些实验的目的不仅在于通过优化堆叠数来优化设备性能,而且还研究作为堆叠数函数的传输特性。

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  • 来源
    《Journal of Vacuum Science & Technology 》 |2010年第3期| P.C3G1-C3G7| 共7页
  • 作者单位

    Department of ECE, Center for High Technology Materials, University of New Mexico, Albuquerque,New Mexico 87106;

    rnDepartment of ECE, Center for High Technology Materials, University of New Mexico, Albuquerque,New Mexico 87106;

    rnDepartment of ECE, Center for High Technology Materials, University of New Mexico, Albuquerque,New Mexico 87106;

    rnDepartment of ECE, Center for High Technology Materials, University of New Mexico, Albuquerque,New Mexico 87106;

    rnDepartment of ECE, Center for High Technology Materials, University of New Mexico, Albuquerque,New Mexico 87106;

    rnDepartment of ECE, Center for High Technology Materials, University of New Mexico, Albuquerque,New Mexico 87106;

    rnDepartment of ECE, Center for High Technology Materials, University of New Mexico, Albuquerque,New Mexico 87106;

    rnDepartment of ECE, Center for High Technology Materials, University of New Mexico, Albuquerque,New Mexico 87106 Korea Research Institute of Standards and Science Korea;

    rnDepartment of ECE, Center for High Technology Materials, University of New Mexico, Albuquerque,New Mexico 87106 Korea Research Institute of Standards and Science Korea;

    rnDepartment of ECE, Center for High Technology Materials, University of New Mexico, Albuquerque,New Mexico 87106;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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