Study of techniques for improving emission uniformity of gated CuO nanowire field emitter arrays

摘要

In this study, the fabrication technologies for a gated CuO nanowire field emitter arrays were investigated. Fabrication process was optimized to achieve uniform emission. More uniform emission is achieved from the CuO nanowire field emitter arrays prepared with an additional lift-off process. The improved uniformity is attributed to the removal of etch residues as well as higher resistance between the CuO nanoemitter and cathode electrode. The study shows that the gated CuO nanowire field emitter arrays have potential for application in high resolution field emission display.