Nanofabrication of photonic crystal-based devices using electron beam spot lithography

摘要

This paper reports on photonic crystal-based devices fabricated via the electron beam spot lithography technique. This technique produces uniform, submicron, and nanometer scale periodic holes over large areas in the millimeter range and the write time is a factor of over 120 times faster than the conventional direct-write technique. Generic design guidelines of this technique are established and the patterning of photonic crystal holes' arrays in the square and hexagonal lattice configurations are investigated. The single spot lithography technique could potentially be useful as a mass fabrication approach, particularly for very large areas of 2D photonic crystal-based devices and possibly for other device fabrication, for a wide range of scientific and technological applications.