Direct-write electron-beam lithography of an IR antenna-coupled microbolometer onto the surface of a hemispherical lens

摘要

This article describes a method for performing direct-write lithography of an IR antenna-coupled microbolometer onto the surface of a hemispherical lens. Antennas on a dielectric half-space receive power more efficiently from the substrate side than from the air side. The use of a hemispherical lens facilitates reception through the substrate as well as elimination of trapped surface waves that would normally occur in the substrate. Using direct-write lithography onto the surface of the hemispherical lens eliminates the potential of an air gap between the antenna and lens. Additionally, the accuracy of alignment between the antenna and the center of the lens is controlled at the lithographic step. As a result, there is increased responsivity is observed in the antenna-coupled microbolometer when illuminated from the substrate-side compared to air-side illumination. (c) 2006 American Vacuum Society.