Compparison of infrared frequency selective surfaces fabricated by direct-write electron-beam and bilayer nanoimprint lithographies

摘要

We report on the fabrication of crossed-dipole resonant filters by direct-write electron-beam an nanoimprint lithographies. Such structures have been used as spectrally selective components at visible, microwave, and infrared wavelengths. Imprinting is accomplished in a modified commercial hot press at 155 deg.C. The replica is ten etched in oxygen plasma and developed in chlorobenzene to selectively dissolve the poly(methylmethacrylate and methacrylic acid) and poly(methylmethacrylare) bilayer resist.