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Photostimulated Near-Resonant Charge Transport over 60 nm in Carbon-Based Molecular Junctions

机译:在碳基分子连接中的60nm上的光刺激近谐振电荷输送

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The bias and temperature dependence of both dark and photo-induced currents in carbon-based molecular junctions were examined over a wide range of oligomeric layer thickness (d) values from 4 to 60 nm. The dark current density versus bias (JV) response of nitroazobenzene molecular junctions exhibits the exponential thickness dependence consistent with coherent tunneling when d < 5 nm, but becomes weakly dependent on d and temperature (T) for d = 15-60 nm. The photocurrent (PC) response is orders of magnitude higher than the dark current for the same d and bias, with very different curve shape and much earlier onset with bias. Although the dark and PC differed greatly in magnitude for d > 14 nm, they both exhibit near zero attenuation coefficients (β < 0.05 nm~(-1)) and are activationless (E_(act) < 5 meV) below ~200 K. For d > 14 nm, both dark and PC become electric field (E) dependent and exhibit approximate overlap of / versus E response for d = 14-60 nm. The value of In J versus E~1/2 is linear for both PC and dark current, with very different magnitudes and slopes. We propose an orbital mediated transport for PC, which involves sequential tunneling of photogenerated electrons and holes between frontier orbitals of adjacent, weakly interacting oligomeric subunits. Such transport is "bulk-limited", E dependent, and nearly activationless due to small tunneling barriers and short distances between adjacent molecular orbitals. In contrast, the dark current is activated and injection limited due to an interfacial energy barrier much larger than that for bulk transport in the junction interior. Rapid, low-barrier transport between orbitals in adjacent molecules should significantly extend the "range" of molecular electronics to >50 nm and avoid the usually strong temperature dependence observed in thicker organic films.
机译:在4至60nm的宽范围的低聚层厚度(d)值中,检查暗和光诱导电流的偏差和温度依赖性。硝基唑的暗电流密度与偏压(JV)偏压(JV)响应具有与D <5 nm相干隧道相干隧穿的指数厚度依赖性,但变得弱依赖于D = 15-60nm的D和温度(T)。光电流(PC)响应是比同一D和偏置的暗电流高的数量级,具有非常不同的曲线形状,并且具有偏差的大得多。虽然D> 14nm的暗量和PC的幅度大大不同,但它们都在零沉析系数附近(β<0.05nm〜(-1)),并且在〜200k下方可激活(E_(ACT)<5 meV)。对于D> 14nm,暗和PC都变为电场(e)依赖性,并且表现出D = 14-60nm的响应的近似重叠。 j的值与e〜1/2为电脑和暗电流的线性,大小和斜坡。我们提出了一种轨道介导的PC运输,其涉及相邻的弱相互作用的低聚亚基的前沿轨道之间的光生电子和孔的顺序隧道。这种运输是“批量限制”,e取决于,并且由于小的隧道屏障和相邻分子轨道之间的短距离而几乎活化。相反,由于界面能量屏障远大于连接内部的散装输送,暗电流被激活和注射限制。在相邻分子中的轨道之间的快速,低阻隔运输应显着延伸分子电子的“范围”至> 50nm,并避免在较厚的有机膜中观察到的通常强烈的温度依赖性。

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  • 来源
    《Journal of the American Chemical Society》 |2020年第36期|15420-15430|共11页
  • 作者单位

    Department of Chemistry University of Alberta Edmonton Alberta T6G 2G2 Canada;

    Department of Chemistry University of Alberta Edmonton Alberta T6G 2G2 Canada;

    Department of Chemistry University of Alberta Edmonton Alberta T6G 2G2 Canada;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 22:16:52

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