Nucleation and growth of diamond in oxyacetylene flame chemical vapour deposition

摘要

Chemical vapour deposition (CVD) of diamond is gradually passing from the labora- tory to the industry scale. ~1,2 Oxyacetylene flame CVD is one of the methods considered to be among the best candidates for the industrial production of diamond. Many practical problems, e. g., achieving simultaneously high growth rates, uniformity and high quality of the deposited diamond, or achieving good adhesion strength of the diamond layer on a substrate etc, are more or less directly related to the mechanism of diamond deposition and knowledge of the dependence of nucleation and growth on various factors.