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Graphene growth from reduced graphene oxide by chemical vapour deposition: seeded growth accompanied by restoration

机译:通过化学气相沉积从还原的氧化石墨烯中生长石墨烯:种子生长伴随修复

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摘要

Understanding the underlying mechanisms involved in graphene growth via chemical vapour deposition (CVD) is critical for precise control of the characteristics of graphene. Despite much effort, the actual processes behind graphene synthesis still remain to be elucidated in a large number of aspects. Herein, we report the evolution of graphene properties during in-plane growth of graphene from reduced graphene oxide (RGO) on copper (Cu) via methane CVD. While graphene is laterally grown from RGO flakes on Cu foils up to a few hundred nanometres during CVD process, it shows appreciable improvement in structural quality. The monotonous enhancement of the structural quality of the graphene with increasing length of the graphene growth from RGO suggests that seeded CVD growth of graphene from RGO on Cu surface is accompanied by the restoration of graphitic structure. The finding provides insight into graphene growth and defect reconstruction useful for the production of tailored carbon nanostructures with required properties.
机译:了解通过化学气相沉积(CVD)进行石墨烯生长的基本机制对于精确控制石墨烯的特性至关重要。尽管付出了很多努力,但石墨烯合成背后的实际过程仍需要在许多方面加以阐明。在本文中,我们报告了通过甲烷CVD从铜(Cu)上还原的氧化石墨烯(RGO)石墨烯平面生长期间石墨烯性能的演变。在CVD工艺中,石墨烯是从RGO薄片在Cu箔上横向生长到几百纳米的,但它的结构质量却有了明显改善。随着RGO中石墨烯生长长度的增加,石墨烯结构质量的单调提高表明,在铜表面上RGO中石墨烯的籽晶CVD生长伴随着石墨结构的恢复。该发现提供了对石墨烯生长和缺陷重建的见解,可用于生产具有所需特性的定制碳纳米结构。

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