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Homogeneous ZnO nanostructure arrays on GaAs substrates by two-step chemical bath synthesis

机译:两步化学浴合成在GaAs衬底上的均相ZnO纳米结构阵列

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ZnO nanostructures, including nanowires, nanorods, and nanoneedles, have been deposited on GaAs substrates by the two-step chemical bath synthesis. It was demonstrated that the O2-plasma treatment of GaAs substrates prior to the sol–gel deposition of seed layers was essential to conformally grow the nanostructures instead of 2D ZnO bunches and grains on the seed layers. Via adjusting the growth time and concentration of precursors, nanostructures with different average diameter (26–225 nm), length (0.98–2.29 μm), and density (1.9–15.3 × 109 cm−2) can be obtained. To the best of our knowledge, this is the first demonstration of ZnO nanostructure arrays grown on GaAs substrates by the two-step chemical bath synthesis. As an anti-reflection layer on GaAs-based solar cells, the array of ZnO nanoneedles with an average diameter of 125 nm, a moderate length of 2.29 μm, and the distribution density of 9.8 × 109 cm−2 has increased the power conversion efficiency from 7.3 to 12.2 %, corresponding to a 67 % improvement.
机译:ZnO纳米结构,包括纳米线,纳米棒和纳米针,已通过两步化学浴合成沉积在GaAs衬底上。结果表明,在种子层的溶胶-凝胶沉积之前,GaAs衬底的O 2 等离子体处理对于在种子层上共形生长纳米结构而不是二维ZnO束和晶粒至关重要。通过调整前驱物的生长时间和浓度,纳米结构具有不同的平均直径(26–225 nm),长度(0.98–2.29μm)和密度(1.9–15.3×10 9 cm -2 )。据我们所知,这是通过两步化学浴合成在GaAs衬底上生长的ZnO纳米结构阵列的首次演示。 ZnO纳米针阵列作为GaAs基太阳能电池上的抗反射层,平均直径为125 nm,中等长度为2.29μm,分布密度为9.8×10 9 cm -2 将功率转换效率从7.3提高到了12.2%,对应的提升是67%。

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