机译:用于浸没式光刻的参数化源-掩模-数值孔径共同优化
Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and Systems (Ministry of Education of China), Beijing 100081, China;
Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and Systems (Ministry of Education of China), Beijing 100081, China;
Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and Systems (Ministry of Education of China), Beijing 100081, China;
Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and Systems (Ministry of Education of China), Beijing 100081, China;
Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and Systems (Ministry of Education of China), Beijing 100081, China;
Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and Systems (Ministry of Education of China), Beijing 100081, China;
computational lithography; source mask optimization; depth of focus;
机译:固体浸没式光刻:用于大曝光场的折射率匹配和共振反射器,超高数值孔径条件下的高长宽比成像
机译:用于193 nm浸没式光刻中的接触孔图案化的圆形孔
机译:固体浸没劳埃德镜作为等离激元增强超高数值孔径光刻的试验台
机译:高折射率浸没式光刻技术和第二代浸没液可实现1.55的数值孔径,从而具有成本效益的32 nm半节距
机译:下一代光刻中的设计技术共同优化。
机译:共振超材料的高通量制造原子层光刻技术实现超小同轴孔径
机译:参数源 - 掩模 - 数值光圈共同优化用于浸入光刻