机译:用于在蓝宝石衬底上形成亚微米图案的双光刻胶互补光刻技术
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan;
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan;
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan;
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan;
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan,National Tsing Hua University, Institute of Nanoengineering and Microsystems, Hsinchu 30013, Taiwan,National Tsing Hua University, Department of Power Mechanical Engineering, Hsinchu 30013, Taiwan;
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan;
dual-photoresist complementary lithography; inorganic oxide photoresist; patterned sapphire substrate; direct laser writing; thermal lithography;
机译:纳米球光刻和纳米压印光刻技术在蓝宝石衬底上形成亚微米尺寸的图案
机译:应用于蓝宝石衬底的双层光刻胶互补光刻技术,用于产生亚微米图案
机译:通过激光干涉光刻技术对图案化的Al薄膜进行退火来制备纳米图案化的蓝宝石衬底
机译:通过双层光致抗蚀剂互补光刻制备的蓝宝石衬底上的亚微米图案
机译:氮化镓在具有蛇形通道的图案化蓝宝石衬底上异质外延生长。
机译:通过软紫外-纳米压印光刻技术对图案化的Al薄膜进行退火处理大规模制造纳米图案化的蓝宝石衬底
机译:通过软紫外-纳米压印光刻技术对图案化的Al薄膜进行退火处理,大规模制造纳米图案化的蓝宝石衬底