机译:基于梯度的光刻光刻联合源偏振掩模优化
Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, 5 South ZhongGuanCun Street, Beijing 100081, China;
Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, 5 South ZhongGuanCun Street, Beijing 100081, China;
Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, 5 South ZhongGuanCun Street, Beijing 100081, China;
Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, 5 South ZhongGuanCun Street, Beijing 100081, China;
Beijing Institute of Technology, School of Optoelectronics, Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, 5 South ZhongGuanCun Street, Beijing 100081, China;
University of Delaware, Department of Electrical and Computer Engineering, Newark, Delaware 19716, United States;
optical lithography; source polarization mask optimization; computational lithography; vector imaging model;
机译:光刻中基于梯度的源和掩模优化
机译:基于梯度的极紫外光刻光刻源掩模优化
机译:针对光刻源的模糊和眩光的鲁棒混合源和掩模优化
机译:光刻中源,掩模和光瞳的联合优化
机译:无光掩模光刻的热驱动微快门阵列器件
机译:带有无源偏振延迟单元的扫频源/傅里叶域偏振敏感光学相干层析成像
机译:光学光刻中光源,掩模和光瞳的联合优化
机译:使用光学光刻和相移掩模制造的红外频率选择表面