Development of extreme ultraviolet scatterometer using multiple orders of high-harmonic generation

摘要

We developed an extreme ultraviolet (EUV) scatterometer equipped with a table-top EUV source for the characterization of nanoscale grating lines. Appropriate orders of high-harmonic generation at wavelengths ranging from 25 to 35 nm are selected as the coherent light source for high-resolution spatial performance. It is shown that the grating surface profile significantly affects the scattered diffraction intensities and can be retrieved by the structure reconstruction algorithms using inverse modeling by rigorous coupled wave analysis.'