EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND USING METHOD OF EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS

摘要

The purpose of the present invention is to provide an extreme ultraviolet light generation apparatus, which includes a variable nozzle capable of supplying a flowing process gas to a condenser based on a result of analyzing a tin contamination pattern, without indiscriminately processing the tin contamination pattern appearing differently according to a setup state of a device of the condenser in the extreme ultraviolet light generation apparatus. The present invention provides the extreme ultraviolet light generation apparatus, an extreme ultraviolet light generation system, and a using method of the extreme ultraviolet light generation apparatus. The extreme ultraviolet light generation apparatus comprises: a collector mirror unit; a gas supplying unit which supplies a processing gas to the collector mirror unit; a gas supply nozzle which is disposed in one region of the collector mirror unit to supply the processing gas to one surface of the collector mirror unit; and a controlling unit which adjusts a shape of a spray hole of the gas supply nozzle. The shape of the spray hole varies according to a control operation of the controlling unit.;COPYRIGHT KIPO 2016