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Effects of excess Pb on structural and electrical properties of Pb(Zr0.48Ti0.52)O3 thin films using MOD process

机译:MOD工艺对Pb(Zr0.48Ti0.52)O3薄膜中过量Pb结构和电性能的影响

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摘要

Pb(Zr0.48Ti0.52)O3 thin films at 20% excess Pb were synthesized on Pt/Ti/SiO2/Si(100) substrates at different annealing temperatures by a metal-organic decomposition process. The microstructure of the PZT films was investigated by x-ray diffraction and atomic force microscopy. The composition of the films was characterized by Rutherford Backscattering Spectroscopy (RBS). These results showed that The PZT films have perovskite phase coexisted with PbO2 phase. The PbO2 phase mainly was formed by excess Pb which congregate at boundaries of crystalline grains during the annealing process and may be absorbed part of oxygen ion at normal sites, thus leading to an increase of oxygen vacancies in the PZT film. PbO2 phase and oxygen vacancies act as pinning centres, which has an effect on the ferroelectric domain switching. This eventually resulted in an increase of fatigue rate in PZT films.
机译:在不同的退火温度下,在Pt / Ti / SiO2 / Si(100)衬底上合成了过量Pb 20%的Pb(Zr0.48 Ti0.52 )O3 薄膜金属有机分解过程的温度。通过X射线衍射和原子力显微镜研究了PZT膜的微观结构。膜的组成通过卢瑟福背散射光谱法(RBS)表征。这些结果表明,PZT薄膜具有钙钛矿相和PbO2 相共存。 PbO2 相主要是由过量的Pb形成的,Pb在退火过程中会聚集在晶粒的边界,并可能在正常位置被一部分氧离子吸收,从而导致PZT膜中氧空位的增加。 PbO2 相和氧空位起着钉扎中心的作用,这影响了铁电畴的转换。最终导致PZT薄膜的疲劳率增加。

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  • 来源
    《Journal of Materials Science》 |2001年第17期|4285-4289|共5页
  • 作者单位

    State Key Laboratory of Functional Materials for Informatics Shanghai Institute of Metallurgy Chinese Academy of Sciences;

    Shanghai Institute of Nuclear Research Chinese Academy of Sciences;

    State Key Laboratory of Functional Materials for Informatics Shanghai Institute of Metallurgy Chinese Academy of Sciences;

    State Key Laboratory of Functional Materials for Informatics Shanghai Institute of Metallurgy Chinese Academy of Sciences;

    State Key Laboratory of Functional Materials for Informatics Shanghai Institute of Metallurgy Chinese Academy of Sciences;

    State Key Laboratory of Functional Materials for Informatics Shanghai Institute of Metallurgy Chinese Academy of Sciences;

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