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首页> 外文期刊>Journal of Materials Science >Stress-impedance effects in sandwiched FeCuNbCrSiB/Cu/FeCuNbCrSiB films fabricated by Microelectromechanical Systems technique
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Stress-impedance effects in sandwiched FeCuNbCrSiB/Cu/FeCuNbCrSiB films fabricated by Microelectromechanical Systems technique

机译:微机电系统技术制备的夹层FeCuNbCrSiB / Cu / FeCuNbCrSiB薄膜的应力阻抗效应

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摘要

Sandwiched FeCuNbCrSiB/Cu/FeCuNbCrSiB films with a serpentine structure have been realized on silicon cantilever by Microelectromechanical Systems technique, and the stress-impedance (SI) effects have been studied in the frequency range of 1–40 MHz. Experimental results show that the values of SI ratio increase with the deflection and a large SI ratio of ?24.1% at 5 MHz with the average tension stress 69.9 MPa and strain 0.048% is obtained in the sandwiched FeCuNbCrSiB/Cu/FeCuNbCrSiB films, which shows attractive for the applications of strain sensors.
机译:通过微机电系统技术在硅悬臂上实现了具有蛇形结构的三明治式FeCuNbCrSiB / Cu / FeCuNbCrSiB薄膜,并研究了在1–40 MHz频率范围内的应力阻抗(SI)效应。实验结果表明,在夹层FeCuNbCrSiB / Cu / FeCuNbCrSiB薄膜中,SI比值随挠度的增加而增大,在5 MHz时SI比值较大,约为24.1%,平均拉应力为69.9 MPa,应变为0.048%。对于应变传感器的应用很有吸引力。

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  • 来源
    《Journal of Materials Science》 |2007年第7期|2450-2454|共5页
  • 作者单位

    National Key Laboratory of Nano/Micro Fabrication Technology Key Laboratory for Thin Film and Microfabrication of Ministry of Education Institute of Micro and Nano Science and Technology Shanghai Jiaotong University Shanghai 200030 China;

    National Key Laboratory of Nano/Micro Fabrication Technology Key Laboratory for Thin Film and Microfabrication of Ministry of Education Institute of Micro and Nano Science and Technology Shanghai Jiaotong University Shanghai 200030 China;

    National Key Laboratory of Nano/Micro Fabrication Technology Key Laboratory for Thin Film and Microfabrication of Ministry of Education Institute of Micro and Nano Science and Technology Shanghai Jiaotong University Shanghai 200030 China;

    National Key Laboratory of Nano/Micro Fabrication Technology Key Laboratory for Thin Film and Microfabrication of Ministry of Education Institute of Micro and Nano Science and Technology Shanghai Jiaotong University Shanghai 200030 China;

    National Key Laboratory of Nano/Micro Fabrication Technology Key Laboratory for Thin Film and Microfabrication of Ministry of Education Institute of Micro and Nano Science and Technology Shanghai Jiaotong University Shanghai 200030 China;

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