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Raman study of the strain and H-2 preconditioning effect on self-assembled Ge island on Si (001)

机译:拉曼研究Si(001)上自组装Ge岛的应变和H-2预处理效应

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An investigation of the microscopic mechanisms of Ge self-assembling island growth is of great importance for future optoelectronic applications of quantum dot nanostructures. In this study, two sets of self-assembled germanium islands on Si (001) substrate, with and without preconditioning using a high-temperature hydrogenation step on their nucleation and subsequent temporal evolution, were grown by low-pressure chemical vapor deposition (LPCVD). The average germanium concentration, mean diameter of Ge crystalline regions and the strain inside the germanium quantum dots are characterized with high resolution micro-Raman spectroscopy (mu RS). Both the intensity and peak position of the Si-Si vibration mode at about 520.07 cm(-1) in the Raman spectra have been used as a reference to separate the germanium Raman signal from the overlapping localized Si-Si optical phonon at similar to 300 cm(-1).In the absence of preconditioning, both the island size and germanium composition increase steadily as a function of deposition time. However, on the H-2 preconditioned surface, the nucleation and growth rates are greatly increased during the first stages and slow down significantly after deposition for 10 s.Our results indicate that the compressive strain inside the islands acts as a barrier for Ge adatoms to diffuse from the wetting layer into the islands. For the growth times used in this study, for both sets of samples with and without H-2 preconditioning, the normalized rate of increase of the Ge concentration (%Delta[Ge]/Delta t) decreases by similar to 0.13/s for a 1% compressive strain increase. The H-2 preconditioning can initially increase the density of island nucleation sites, but cannot accelerate the Ge island growth. It tends to lower %Delta[Ge]/Delta t by 0.015/s instead. The decreased strain due to surface roughing is the principal reason why the Ge islands grow so rapidly at the beginning on the H-2 preconditioned samples. (C) 2005 Springer Science + Business Media, Inc.
机译:Ge自组装岛生长的微观机制的研究对于量子点纳米结构的未来光电应用具有重要意义。在这项研究中,通过低压化学气相沉积(LPCVD)在硅(001)衬底上进行了两套自组装锗岛的生长,在有无晶核形成和不经过高温氢化步骤对其进行成核和随后的时间演化的条件下, 。用高分辨率显微拉曼光谱法(mu RS)表征平均锗浓度,Ge晶体区域的平均直径和锗量子点内部的应变。在拉曼光谱中大约520.07 cm(-1)处的Si-Si振动模式的强度和峰值位置都已用作将锗拉曼信号从重叠的局部Si-Si光学声子中分离出来的参考,其频率约为300 cm(-1)。在不进行预处理的情况下,岛的大小和锗组成均随沉积时间而稳定增加。然而,在H-2预处理过的表面上,成核和生长速率在第一阶段大大增加,并且在沉积10 s后显着减慢。我们的结果表明,孤岛内部的压缩应变是Ge原子原子迁移的障碍。从润湿层扩散到岛中。对于本研究中使用的生长时间,对于有和没有进行H-2预处理的两组样品,Ge浓度的归一化增长率(%Delta [Ge] / Delta t)降低约0.13 / s。压缩应变增加1%。 H-2预处理可以最初增加岛形核位置的密度,但不能加速Ge岛的生长。相反,它倾向于将%Delta [Ge] / Delta t降低0.015 / s。由于表面粗糙而引起的应变降低是Ge岛在H-2预处理样品开始时如此迅速生长的主要原因。 (C)2005年Springer Science + Business Media,Inc.

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