Sputtered rutile stoichiometric TiO_(2) nanocrystalline films

摘要

Titanium dioxide (TiO_(2)) films were prepared at room temperature on silicon and glass substrates using DC reactive magnetron sputtering at the rate of 0.1 nms~(-1) from a pure metal Ti target. X-ray diffraction (XRD) studies on freshly prepared samples showed a purely rutile phase. It is found from AFM that annealing of fresh TiO_(2) films at 550 deg C for 30 min produced an increase in grain size by a factor of at least 1.5. X-ray photoelectron spectroscopies (XPS) gives correct ratio for purely TiO_(2) stoichiometry. Optical band gap was estimated to be 3.2 eV from UV-vis transmission spectra.