Electronic characterization of several 100 μm thick epitaxial GaAs layers

摘要

Non intentionally doped thick epitaxial GaAs layers, grown by chemical vapour phase epitaxy using a high growth rate, are characterized by different electrical techniques applied on a junction (forward and reverse Current-Voltage characteristics, Current versus time and temperature, Deep Level Transient Spectroscopy, Capacitance-Voltage measurements) in order to detect the defects they contain. Experimental data are coupled with theoretical modelling to determine the electrical characteristics of the layers: type and concentration of the carriers, energy levels and concentrations of the defects, associated minority carrier lifetime. The results obtained indicate that i) the concentration of the residual impurities is in the order of 10~(13) to 10~(14) cm~(-3), ii) the layers contain two shallow defects (at 0.12 and 0.21 eV below the conduction band Ec) slightly compensated by a deep defect (at Ec-0.5 eV) and iii) the deep defect is in low concentration (10~(12) cm~(-3)), resulting in a minority carrier lifetime still limited by the radiative recombination process. Therefore, epilayers obtained using high growth rates exhibit electronic properties very similar to the ones obtained using conventional epitaxial techniques. The good and uniform electronic properties of these layers coupled with the lowrnyield of the fluorescence of GaAs is interesting for high resolution X-ray detection.