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机译:CdCl_2气氛下的后退火对直流磁控溅射沉积ITO薄膜性能的影响
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, People's Republic of China;
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, People's Republic of China;
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, People's Republic of China;
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, People's Republic of China;
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, People's Republic of China;
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, People's Republic of China;
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, People's Republic of China;
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, People's Republic of China;
College of Materials Science and Engineering, Sichuan University, Chengdu 610064, People's Republic of China;
机译:CdCl 2 sub>气氛下的后退火对直流磁控溅射沉积ITO薄膜性能的影响
机译:后退火气氛对直流和射频磁控共溅射沉积氧化锌镉薄膜的微观结构,光电性能的影响
机译:退火型气氛对DC和RF磁控膜沉积的锌氧化镉膜的微观结构,光学和电性能的影响
机译:蒸气CDCL_2治疗对R.F的CDS薄膜性能的影响。磁控溅射
机译:直流反应磁控溅射沉积的新型薄膜透明导电氧化物。
机译:直流磁控溅射沉积TiO2薄膜的生物相容性和表面性质
机译:铟和氢共掺杂对DC磁控溅射沉积的氧化锌薄膜光学和电性能的影响