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首页> 外文期刊>Journal of materials science >Growth of CZTS thin films by sulfurization of sputtered single-layered Cu-Zn-Sn metallic precursors from an alloy target
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Growth of CZTS thin films by sulfurization of sputtered single-layered Cu-Zn-Sn metallic precursors from an alloy target

机译:通过从合金靶材硫化单层溅射的Cu-Zn-Sn金属前驱体的硫化来生长CZTS薄膜

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摘要

Cu_2ZnSnS_4 (CZTS) thin films were prepared by sulfurizing single-layered metallic Cu-Zn-Sn precursors which were deposited by DC magnetron sputtering using a Cu-Zn-Sn ternary alloy target. The composition, micro-structure and properties of the CZTS thin films prepared under different sputtering pressure and DC power were investigated. The results showed that the sputtering rate of Cu atom increases as the sputtering pressure and DC power increased. The microstructure of CZTS thin films can be optimized by sputtering pressure and DC power. The CZTS thin film prepared under 1 Pa and 30 W showed a pure Kesterite phase and a dense micro-structure. The direct optical band gap of this CZTS thin film was calculated as 1.49 eV with a high optical absorption coefficient over 10~4 cm~(-1). The Hall measurement showed the film is a p-type semiconductor with a resistivity of 1.06 Ω cm,acarrierconcentration of 7.904 × 10~(17)cm~(-3) and a mobility of 7.47 cm~2 Vs~(-1).
机译:通过硫化单层金属Cu-Zn-Sn前驱体制备Cu_2ZnSnS_4(CZTS)薄膜,该单层金属前驱体是使用Cu-Zn-Sn三元合金靶通过直流磁控溅射沉积的。研究了在不同溅射压力和直流功率条件下制备的CZTS薄膜的组成,微观结构和性能。结果表明,Cu原子的溅射速率随溅射压力和直流功率的增加而增加。可以通过溅射压力和直流功率优化CZTS薄膜的微观结构。在1 Pa和30 W下制备的CZTS薄膜表现出纯的Kesterite相和致密的微观结构。该CZTS薄膜的直接光学带隙经计算为1.49 eV,在10〜4 cm〜(-1)范围内具有较高的光吸收系数。霍尔测量表明该膜是电阻率为1.06Ωcm,载流子浓度为7.904×10〜(17)cm〜(-3),迁移率为7.47 cm〜2 Vs〜(-1)的p型半导体。

著录项

  • 来源
    《Journal of materials science》 |2013年第12期|4958-4963|共6页
  • 作者单位

    College of Information Science and Engineering, Ningbo University, Ningbo 315211, People's Republic of China;

    College of Information Science and Engineering, Ningbo University, Ningbo 315211, People's Republic of China;

    Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, People's Republic of China;

    College of Information Science and Engineering, Ningbo University, Ningbo 315211, People's Republic of China;

    Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, People's Republic of China;

    Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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