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首页> 外文期刊>Journal of materials science >Influence of temperature,voltage and hydrogen on the reversible transition of electrical conductivity in sol-gel grown nanocrystalline TiO_2 thin film
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Influence of temperature,voltage and hydrogen on the reversible transition of electrical conductivity in sol-gel grown nanocrystalline TiO_2 thin film

机译:温度,电压和氢对溶胶-凝胶生长纳米TiO_2薄膜中电导率可逆转变的影响

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摘要

Undoped nanocrystalline p-type TiO_2 thin film was deposited by sol-gel method on a thermally oxidized p-Si (2-5Ω cm resistivity and 〈100〉 orientation) substrate. The thin film was characterized by two-dimensional X-ray Diffraction (2D-XRD) and Field Emission Scanning Electron Microscopy (FESEM) to confirm the formation of stable nano crystalline anatase titania and to determine the grain size (~ 10 nm). Optical absorption spectroscopy was carried out to ascertain the band gap of the material. Two lateral Pd contacts were used as the metal electrodes to TiO_2 thin film to study the electrical conductivity. A clear p- to n-type transition was observed at 240 ℃ and a bias voltage of 0.83 V and the effect was enhanced on exposure to H2 gas. The thin film showed fully n-type conductivity at 275 ℃ and 0.1 V. However, the reversal of the type of conductivity from n- to p-type was observed below 240℃ during lowering the temperature. The creation of oxygen vacancy and the diffusion of lattice oxygen to the surface of TiO_2 thin film might be the most possible mechanism of such transitions. Presence of hydrogen enhanced the process.
机译:通过溶胶-凝胶法将未掺杂的纳米晶p型TiO_2薄膜沉积在热氧化的p-Si(2-5Ωcm电阻率和<100>取向)衬底上。通过二维X射线衍射(2D-XRD)和场发射扫描电子显微镜(FESEM)对薄膜进行表征,以确认形成稳定的纳米晶锐钛矿型二氧化钛并确定晶粒尺寸(约10 nm)。进行光吸收光谱法以确定材料的带隙。使用两个横向的Pd接触作为TiO_2薄膜的金属电极来研究电导率。在240℃和0.83 V的偏压下观察到清晰的由p型到n型的转变,暴露在氢气中的效果增强。薄膜在275℃和0.1 V时显示出完全的n型电导率。但是,在降低温度的过程中,在240℃以下观察到了从n型到p型的电导率反转。氧空位的产生和晶格氧向TiO_2薄膜表面的扩散可能是这种转变的最可能机制。氢的存在增强了该过程。

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  • 来源
    《Journal of materials science 》 |2013年第5期| 1658-1663| 共6页
  • 作者单位

    Department.of Electronics and Telecommunications Engineering, Bengal Engineering and Science University,Shibpur, Howrah 711103, India;

    IC Design and Fabrication Centre, Department of Electronics and Telecommunications Engineering, Jadavpur University,Kolkata 700032, India;

    IC Design and Fabrication Centre, Department of Electronics and Telecommunications Engineering, Jadavpur University,Kolkata 700032, India;

    IC Design and Fabrication Centre, Department of Electronics and Telecommunications Engineering, Jadavpur University,Kolkata 700032, India;

    IC Design and Fabrication Centre, Department of Electronics and Telecommunications Engineering, Jadavpur University,Kolkata 700032, India;

    Department.of Electronics and Telecommunications Engineering, Bengal Engineering and Science University,Shibpur, Howrah 711103, India;

    IC Design and Fabrication Centre, Department of Electronics and Telecommunications Engineering, Jadavpur University,Kolkata 700032, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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