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Effect of Dy_2O_3 doping on microstructure, electrical and dielectric properties of ZnO-V_2O_5-based varistor ceramics

机译:Dy_2O_3掺杂对ZnO-V_2O_5基压敏陶瓷微观结构,电性能和介电性能的影响

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摘要

The effect of Dy_2O_3 doping on the microstructure, electrical and dielectric properties of ZnO-V_2O_5-based varistor ceramics was systematically investigated. The average grain size decreased from 5.5 to 5.2 μm to a small extent until the amount of the doped Dy_2O_3 reaches 0.1 mol%. The sintered densities of the doped samples also increased from 5.51 to 5.58 g/cm~3 to a small extent with increasing Dy_2O_3 amount. The breakdown field increased from 4552 to 5117 V/cm until the amount of the doped Dy_2O_3 reaches 0.1 mol%. The sample doped with 0.1 mol% Dy_2O_3 exhibited good non-ohmic properties: 53.3 in the non-ohmic coefficient, and 0.21 mA/cm~2 in the leakage current density. In addition, the dielectric constant and dissipation factor exhibited a minimum value, 713.1 and 0.205 at 0.1 mol%, respectively.
机译:系统地研究了Dy_2O_3掺杂对ZnO-V_2O_5基压敏陶瓷微观结构,电性能和介电性能的影响。平均晶粒尺寸从5.5μm减小至5.2μm,直到Dy_2O_3的掺杂量达到0.1mol%为止。随着Dy_2O_3含量的增加,掺杂样品的烧结密度也从5.51增加到5.58 g / cm〜3。击穿场从4552V / cm增加到5117V / cm,直到掺杂的Dy_2O_3的量达到0.1mol%。掺杂0.1mol%Dy_2O_3的样品表现出良好的非欧姆特性:非欧姆系数为53.3,漏电流密度为0.21mA / cm〜2。另外,介电常数和耗散因数在0.1mol%时分别显示出最小值713.1和0.205。

著录项

  • 来源
    《Journal of materials science》 |2015年第12期|10217-10224|共8页
  • 作者

    Choon-W. Nahm;

  • 作者单位

    Semiconductor Ceramics Laboratory, Department of Electrical Engineering, Dongeui University, Busan 47340, Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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