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Electrical and luminescence properties of Zn~(2+) doped CuI thin films

机译:Zn〜(2+)掺杂CuI薄膜的电和发光特性

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摘要

Zn~(2+) doped CuI thin films were prepared by vacuum evaporation technique. The influence of the dopant on crystalline, electrical and luminescence properties of the CuI thin films were investigated. An enhancement in crystallization and the shift of (111) peak were found in the Zn~(2+) doped Cu_1 films. The native p-type semiconductor of CuI film changed to n-type one for doping concentration up to 2 mol%. Such change is due to the mechanism that the Zn~(2+) ions not only fill the Cu vacancies but also donate free electrons. For the n-type Cu_1 films, the minimal resistivity and maximal electron concentration was found for the 4 mol% Zn~(2+) doped sample. All Zn~(2+) doped CuI thin films showed the 410 and 422 nm near-band emissions. The intensity of the 422 nm emission was significantly improved with 1 mol% Zn~(2+) doping. The observation can be explained by the increase of the donor-acceptor pairs in the film.
机译:采用真空蒸发技术制备了Zn〜(2+)掺杂的CuI薄膜。研究了掺杂剂对CuI薄膜的晶体,电学和发光性能的影响。在掺杂Zn〜(2+)的Cu_1薄膜中发现了结晶的增强和(111)峰的移动。 CuI膜的天然p型半导体变为n型,掺杂浓度达到2mol%。这种变化是由于Zn〜(2+)离子不仅填充了Cu空位,而且还提供了自由电子。对于n型Cu_1薄膜,发现掺杂4 mol%Zn〜(2+)的样品的最小电阻率和最大电子浓度。所有掺杂Zn〜(2+)的CuI薄膜均显示出410和422 nm的近带发射。 1 mol%Zn〜(2+)掺杂显着提高了422 nm发射强度。该观察可以通过膜中供体-受体对的增加来解释。

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  • 来源
    《Journal of materials science 》 |2015年第4期| 2629-2633| 共5页
  • 作者单位

    Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China;

    Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China;

    Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China;

    Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China;

    Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China;

    Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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