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首页> 外文期刊>Journal of materials science >Study of structural, electrical and optical properties of Ni-doped SnO_2 for device application: experimental and theoretical approach
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Study of structural, electrical and optical properties of Ni-doped SnO_2 for device application: experimental and theoretical approach

机译:Ni掺杂SnO_2在器件中的结构,电学和光学性质研究:实验和理论方法

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摘要

In the present work, we explore the change in properties in Ni doped SnO_2 thin film. Rietveld analysis shows that the effect of doping is interstitial and not substitutional. WH plot shows the strain effect on the crystallite size. High-resolution transmission electron microscopy images of the pure and doped sample are in sync with the X-Ray Diffraction results. The impedance drop with frequency is observed to be steeper for the doped sample which can be used in devices where fast impedance switching is needed. The theoretical study reveals the equivalent circuit. The Raman spectra of the samples were observed to show a redshift due to doping. To the best of our knowledge, this is the first study where the electrical and optical properties of pure and Ni doped SnO_2 were explored, experimentally as well as theoretically using this approach.
机译:在目前的工作中,我们探索了Ni掺杂SnO_2薄膜的性能变化。 Rietveld分析表明,掺杂的影响是间隙的而不是替代的。 WH图显示了应变对微晶尺寸的影响。纯样品和掺杂样品的高分辨率透射电子显微镜图像与X射线衍射结果同步。对于掺杂样品,观察到随着频率的阻抗下降更陡峭,该掺杂样品可用于需要快速阻抗切换的设备中。理论研究揭示了等效电路。观察到样品的拉曼光谱由于掺杂而显示出红移。据我们所知,这是首次研究,无论是在实验上还是在理论上都使用这种方法探索了纯Ni掺杂的SnO_2的电学和光学性质。

著录项

  • 来源
    《Journal of materials science》 |2017年第23期|18003-18014|共12页
  • 作者单位

    National Institute of Technology Meghalaya, Shillong, India,CMR Institute of Technology, Bengaluru, India;

    Indian Institute of Technology Delhi, New Delhi, India;

    National Institute of Technology Meghalaya, Shillong, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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