首页> 外文期刊>Journal of materials science >Growth and electrical properties of epitaxial 0.7Pb(Mg_(1/3)Nb_(2/3))O_3- 0.3PbTiO_3 thin film by pulsed laser deposition
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Growth and electrical properties of epitaxial 0.7Pb(Mg_(1/3)Nb_(2/3))O_3- 0.3PbTiO_3 thin film by pulsed laser deposition

机译:脉冲激光沉积外延0.7Pb(Mg_(1/3)Nb_(2/3))O_3- 0.3PbTiO_3薄膜的生长和电学性质

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摘要

Abstract (100)-oriented epitaxial relaxor ferroelectric 0.7Pb(Mg~(1/3)Nb~(2/3))O~(3)-0.3PbTiO~(3)(PMN-0.3PT) thin film was prepared on SrRuO~(3)-buffered SrTiO~(3)single-crystal substrate by pulsed laser deposition. The phase and domain structure, ferroelectric and piezoelectric properties, and leakage current behavior were studied. Results indicated well saturated polarization-versus-electric field hysteresis loops with large remnant polarization of 30 µC/cm_(2)and coercive field of 11 kV/mm was obtained. The analysis on the leakage current behavior proposed that linear ohmic conduction and Fowler–Nordheim tunneling were the dominant mechanism for the electric field amplitude below and above 15 kV/mm, respectively. Furthermore, the epitaxial PMN-0.3PT thin film exhibited excellent local piezoelectric response and in situ electric-field-induced domain switching behavior. These results suggest the potential applications of the present epitaxial PMN-0.3PT film in integrated ferroelectric devices.
机译:摘要在其上制备了(100)取向外延弛豫铁电体0.7Pb(Mg〜(1/3)Nb〜(2/3))O〜(3)-0.3PbTiO〜(3)(PMN-0.3PT)薄膜。 SrRuO〜(3)缓冲SrTiO〜(3)单晶衬底的脉冲激光沉积。研究了相和畴结构,铁电和压电特性以及漏电流行为。结果表明,获得了良好的饱和极化相对于电场的磁滞回线,其剩余极化为30μC/ cm_(2),矫顽场为11 kV / mm。对泄漏电流行为的分析表明,线性欧姆传导和Fowler-Nordheim隧穿分别是电场振幅低于15kV / mm的主要机制。此外,外延PMN-0.3PT薄膜表现出优异的局部压电响应和原位电场诱导的畴切换行为。这些结果表明本外延PMN-0.3PT膜在集成铁电器件中的潜在应用。

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  • 来源
    《Journal of materials science》 |2018年第8期|6779-6784|共6页
  • 作者单位

    Key Laboratory of Optoelectronic Material and Device, Department of Physics, Shanghai Normal University;

    Key Laboratory of Optoelectronic Material and Device, Department of Physics, Shanghai Normal University;

    Key Laboratory of Optoelectronic Material and Device, Department of Physics, Shanghai Normal University;

    Key Laboratory of Optoelectronic Material and Device, Department of Physics, Shanghai Normal University;

    Key Laboratory of Optoelectronic Material and Device, Department of Physics, Shanghai Normal University;

    Key Laboratory of Optoelectronic Material and Device, Department of Physics, Shanghai Normal University;

    Key Laboratory of Resource Chemistry of Education Ministry, Department of Chemistry, Shanghai Normal University;

    Key Laboratory of Inorganic Functional Material and Device, Shanghai Institute of Ceramics;

    Key Laboratory of Optoelectronic Material and Device, Department of Physics, Shanghai Normal University;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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