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Effects of lanthanum nitrate buffer layer on the orientation and piezoelectric property of Pb(Zr,Ti)O_3 thick film

机译:硝酸镧缓冲层对Pb(Zr,Ti)O_3厚膜取向和压电性能的影响

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摘要

Highly oriented Pb(Zr,Ti)O_3 (PZT) films were deposited on Pt/Ti/SiO_2/Si substrates by the sol-gel method using lanthanum nitrate as a buffer layer. When the lanthanum nitrate buffer layer was heat treated at temperatures between 450 and 550 deg C, the PZT layer coated onto this buffer layer showed a strong (100) preferred orientation. Regardless of the other deposition conditions, such as the pyrolysis temperature, pyrolysis time, annealing temperature and heating rate, the film deposited on the buffer layer had this orientation. Thick films were also fabricated using the sol-gel multi-coating method, and the (100) texture was found to be maintained up to a thickness of 10 mu m. The ferroelectric hysteresis and piezoelectric coefficient (d_(33)) of highly oriented PZT thick films were characterized, and the (100) oriented PZT film showed higher piezoelectric property than the (111) oriented film.
机译:采用硝酸镧作为缓冲层,通过溶胶-凝胶法在Pt / Ti / SiO_2 / Si衬底上沉积了高取向的Pb(Zr,Ti)O_3(PZT)薄膜。当在450至550℃之间的温度下热处理硝酸镧缓冲层时,涂覆在该缓冲层上的PZT层显示出强的(100)优选取向。不管其他沉积条件如何,例如热解温度,热解时间,退火温度和加热速率,沉积在缓冲层上的膜都具有该取向。还使用溶胶-凝胶多层涂布法制造了厚膜,发现(100)织构可以保持到10μm的厚度。表征了高取向的PZT厚膜的铁电磁滞和压电系数(d_(33)),并且(100)取向的PZT膜表现出比(111)取向的膜更高的压电性能。

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