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首页> 外文期刊>Journal of Materials Research >Ferroelectric and piezoelectric properties of highly oriented Pb(Zr,Ti)O_3 film grown on Pt/Ti/SiO_2/Si substrate using conductive lanthanum nickel nitrate buffer layer
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Ferroelectric and piezoelectric properties of highly oriented Pb(Zr,Ti)O_3 film grown on Pt/Ti/SiO_2/Si substrate using conductive lanthanum nickel nitrate buffer layer

机译:利用导电硝酸镧镍缓冲层在Pt / Ti / SiO_2 / Si衬底上生长的高取向Pb(Zr,Ti)O_3薄膜的铁电和压电特性

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摘要

The orientation and electrical properties of Pb(Zr,Ti)O_3 thin films deposited on a Pt/Ti/SiO_2/Si substrate using lanthanum nickel nitrate as a conductive buffer layer were analyzed. The lanthanum nickel nitrate buffer layer was not only electrically conductive but also effective in controlling the texture of the lead zirconate titanate (PZT) thin film. The role of the lanthanum nickel nitrate buffer layer and its effects on the orientation of the PZT thin film were analyzed by x-ray diffraction, electron beam back-scattered diffraction, and scanning electron microscopy. The annealed lanthanum nickel nitrate buffer layer was sufficiently conducting for use in longitudinal electrode configuration devices. The dielectric, ferroelectric, and piezoelectric properties of the highly (100) oriented PZT films grown with the lanthanum nickel nitrate buffer layer were measured and compared with those of (111) and (100) oriented PZT films deposited without a buffer layer.
机译:分析了使用硝酸镧镍作为导电缓冲层沉积在Pt / Ti / SiO_2 / Si衬底上的Pb(Zr,Ti)O_3薄膜的取向和电学性能。硝酸镧镍缓冲层不仅导电,而且对控制锆钛酸铅(PZT)薄膜的质构也有效。通过X射线衍射,电子束背散射衍射和扫描电子显微镜分析了镧镧硝酸镍缓冲层的作用及其对PZT薄膜取向的影响。退火的硝酸镧镍镍缓冲层具有足够的导电性,可用于纵向电极配置设备。测量了用硝酸镧镍缓冲层生长的高度(100)取向的PZT膜的介电,铁电和压电性能,并将其与未沉积缓冲层的(111)和(100)取向的PZT膜进行了比较。

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