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机译:微波氢等离子体退火制备TiSi2 sub>
Microelectronic Device ampamp System Laboratory Department of Electronics Engineering Chungnam National University Gung-Dong Yusong-Gu 305-764 Daejeon Korea;
Microelectronic Device ampamp System Laboratory Department of Electronics Engineering Chungnam National University Gung-Dong Yusong-Gu 305-764 Daejeon Korea;
School of Materials Science and Engineering ShangHai Jiao Tong University 1954 Huashan Street 200030 Peoples Republic of China;
microwave hydrogen plasma annealing; silicide; titanium;
机译:微波氢等离子体退火制备TiSi_2
机译:通过软氢等离子体和退火较少层MOS2在几层MOS2上的鲁棒制造
机译:电子回旋共振微波氮氢混合等离子体后氧化退火改善SiO2 / 4H-SiC界面性能
机译:退火后离子等离子体涂层AlN-TiB2(TiSi2)的特性
机译:第一部分:微波加热和放电等离子体对环境污染物的破坏。第二部分使用放电等离子体从水和甲烷中产生氢。
机译:通过混合微波退火在不到一分钟的时间内制造石墨烯基电极
机译:基于AlN-TiB2(TiSi2)的离子-等离子体纳米结构涂层的高温退火