Synthesis of Diamond-Like Carbon Films on Si Substrate with Different Filling Gases Using a Novel Miniature Dense Plasma Focus Device

摘要

A low energy (60 J) miniature plasma focus with novel configuration was used to deposit diamond-like carbon films at room temperature on Si (1 0 0) substrates. The samples were deposited using 200 numbers of shots, and at off-center position with argon and methane as filling gases. The structure of deposited films are determined by X-ray diffractometry (XRD), surface morphology by scanning electron microscopy (SEM), component bonds by Raman spectroscopy and elemental composition by energy dispersive X-ray (EDX) analysis. The XRD data showed that the samples had only diffraction peaks related to SiO_2 and there were no observable peaks related to carbon. SEM micrographs showed uniformly distributed film with small nanoparticles. Raman spectroscopy verified the formation of amorphous carbon with D and G peaks. The D and G peak positions along with change in intensity ratio (I_D/I_G) in the samples prepared with different filling gases were investigated. The EDX spectra showed the presence of expected constituent elements.