Determination of Oxide Thickness on an Si_2N_2O-ZrO_2 Composite by Spectroscopic Ellipsometry

摘要

Initial oxidation behaviour of an Si_2N_2O-ZrO_2 composite material has been investigated by spec-troscopic ellipsometry (SE), X-ray diffraction {XRD), and scanning electron microscopy (SEM). The material was exposed to air in the temperature range of 1000-1450℃ and the oxide layer thickness was determined by SE using the Bruggeman effective medium approximation for the modelling of the oxide layer. It was shown that the oxide film on a porous Si_2N_2O-ZrO_2 material can be characterized by SE. The results provide important information about film growth in the initial stage of oxidation of this composite. The optical constants for the composite and ZrO_2 were determined.