Patent Issued for Method for Attenuated Total Reflection Far Ultraviolet Spectroscopy and an Apparatus for Measuring Concentrations Therewith

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Patent Issued for Method for Attenuated Total Reflection Far Ultraviolet Spectroscopy and an Apparatus for Measuring Concentrations Therewith

机译：衰减全反射远紫外光谱法及其浓度测量装置的专利发布

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2013 MAR 20 (VerticalNews) -- By a News Reporter-Staff News Editor at Journal of Engineering --nAccording to news reporting originating from Alexandria, Virginia, by VerticalNews journalists, a patent bynthe inventors Higashi, Noboru (Neyagawa, JP); Kariyama, Naomi (Neyagawa, JP); Ikehata, Akifumin(Tsukuba, JP), filed on March 3, 2009, was cleared and issued on March 5, 2013.

机译：2013年3月20日（VerticalNews）-由Engineering Journal的新闻记者-Staff新闻编辑撰写--n据VerticalNews记者发自弗吉尼亚州亚历山大市的新闻报道，这是发明人Higashi Noboru的专利（Neyagawa，JP）；香山直美（Neyagawa，JP）；于2009年3月3日提交的Akifumin Ikehata（Tsukuba，JP）于2013年3月5日获得批准并发布。

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《Journal of Engineering》 |2013年第12期|1-4|共4页
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Quartz; Electronics; Semiconductor; Silicon Dioxide; Kurashiki Boseki Kabushiki Kaisha.;

机译：Kurrtz;Ectron CS;Cemikonzu c和r;Shikon konjide;Kurashiki Boseki Kabushiki Kaisha。;
入库时间 2022-08-17 23:46:56

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2. Potential of Far-Ultraviolet Absorption Spectroscopy as a Highly Sensitive Analysis Method for Aqueous Solutions. Part II: Monitoring the Quality of Semiconductor Wafer Cleaning Solutions Using Attenuated Total Reflection [J] . Applied Spectroscopy . 2008,第9期

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3. Potential of Far-Ultraviolet Absorption Spectroscopy as a Highly Sensitive Analysis Method for Aqueous Solutions. Part II: Monitoring the Quality of Semiconductor Wafer Cleaning Solutions Using Attenuated Total Reflection [J] . NOBORU HIGASHI, AKIFUMI IKEHATA, NAOMI KARIYAMA, Applied Spectroscopy: Society for Applied Spectroscopy . 2008,第9期

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Patent Issued for Method for Attenuated Total Reflection Far Ultraviolet Spectroscopy and an Apparatus for Measuring Concentrations Therewith

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