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首页> 外文期刊>Journal of Electronic Packaging >The Strength of High-Temperature Ag-ln Joints Produced Between Copper by Fluxless Low-Temperature Processes
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The Strength of High-Temperature Ag-ln Joints Produced Between Copper by Fluxless Low-Temperature Processes

机译:无通量低温工艺在铜之间产生的高温Ag-In接头的强度

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Two copper (Cu) substrates were bonded using silver (Ag) and indium (In) and annealed at 200-250℃ to convert the joints into the solid solution (Ag)for enhanced strength and ductility. Cu-Cu pair was chosen so that the samples break in the joint during shear test. The upper Cu was electroplated with 15 μm Ag. The lower Cu was plated with 15 μm Ag, followed by In and 0.1 μm Ag to inhibit indium oxidation. Two designs were implemented, using 8μm and 5μm In, respectively. The Cu substrates were bonded at 180℃ in 100 mTorr vacuum without flux. Afterwards, samples were annealed at 200℃ for 1000 h (first design) and at 250℃ for 350 h (second design), respectively. Scanning electron microscope with energy dispersive X-ray analysis (SEM and EDX) results indicate that the joint of the first design is an alloy of mostly (Ag) with micron-size Ag_2In and (ζ) regions, and that of second design has converted to a single (Ag) phase. Shear test results show that the samples are very strong. The breaking forces far exceed requirements in MIL-STD-883 H standards. Fracture incurs inside the joint and is a mix of brittle and ductile modes or only ductile mode. The joint solidus temperatures are 600℃ and 900℃ for the first and second designs, respectively.
机译:使用银(Ag)和铟(In)粘合两个铜(Cu)基板,并在200-250℃退火以将接头转变为固溶体(Ag),以提高强度和延展性。选择了铜-铜对,以使样品在剪切试验过程中断裂。上层铜电镀有15μm的银。下部的Cu镀有15μm的Ag,然后加入In和0.1μm的Ag以抑制铟的氧化。实现了两种设计,分别使用8μm和5μmIn。铜基板在无焊剂的情况下在100毫托真空度下于180℃粘合。然后,分别在200℃下退火1000 h(第一个设计)和250℃下退火350 h(第二个设计)。扫描电子显微镜的能量色散X射线分析(SEM和EDX)结果表明,第一种设计的接头主要是(Ag)的微米尺寸Ag_2In和(ζ)区域的合金,而第二种设计的接头已转化到一个单一(Ag)阶段。剪切测试结果表明样品非常坚固。断裂力远远超过MIL-STD-883 H标准的要求。骨折发生在关节内部,是脆性和延性模式的混合,或者仅是延性模式。第一种和第二种设计的联合固相线温度分别为600℃和900℃。

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