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Effects of GaAs-Spacer Strain on Vertical Ordering of Stacked InAs Quantum Dots in a GaAs Matrix

机译:GaAs-间隔物应变对GaAs矩阵中堆叠式InAs量子点垂直排列的影响

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摘要

Vertical ordering in stacked layers of Inds/GaAs quantum dots is currently the focus of scientific research because of its potential for optoelectronics applica- tions. Transmission electron microscopy was applied to study InAs/GaAs stacked layers grown by molecular-beam-epitaxy with various thicknesses of GaAs spacer. Thickness dependencies of quantum dot size and their ordering were observed experimentally and, then, compared with the results of strain calcula- tions based on the finite element method. The vertical ordering did occur when the thickness of the GaAs spacer was comparable with the dot height. The ordering was found to be associated with relatively large InAs dots on the first layer. Quantum dots tend to become larger in size and more regular in plane with increasing numbers of stacks. Our results suggest that the vertical ordering is not only affected by strain from the InAs dots on the lower layer, but by total strain configuration in the multi-stacked structure.
机译:Inds / GaAs量子点的堆叠层中的垂直有序性是当前研究的重点,因为它具有光电应用的潜力。利用透射电子显微镜研究了通过各种厚度的GaAs间隔物的分子束外延生长的InAs / GaAs堆叠层。通过实验观察了量子点尺寸的厚度依赖性及其顺序,然后将其与基于有限元方法的应变计算结果进行了比较。当GaAs间隔层的厚度与点高相当时,确实发生了垂直排序。发现该顺序与第一层上相对较大的InAs点相关。随着堆叠数量的增加,量子点趋于变得更大,并且在平面上更规则。我们的结果表明,垂直顺序不仅受下层InAs点的应变影响,而且还受到多层结构中总应变构型的影响。

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