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Molecular Beam Epitaxy Growth of HgCdTe on Large-Area Si and CdZnTe Substrates

机译:HgCdTe在大面积Si和CdZnTe衬底上的分子束外延生长

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This paper presents the status of HgCdTe growth on large-area Si and CdZnTe substrates at Raytheon Vision Systems (RVS). The different technological tools that were used to scale up the growth from 4 inch to 6 inch diameter on Si and from 4 cm × 4 cm to 8 cm × 8 cm on CdZnTe without sacrificing the quality of the layers are described. Extremely high compositional uniformity and low macrodefect density were achieved for single- and two-color HgCdTe layers on both Si and CdZnTe substrates. Finally, a few examples of detector and focal-plane array results are included to highlight the importance of high compositional uniformity and uniformly low macrodefect density of the epitaxial layers in obtaining high operability and low cluster outages in single- and two-color focal-plane arrays (FPAs).
机译:本文介绍了雷神视觉系统(RVS)上HgCdTe在大面积Si和CdZnTe衬底上的生长状况。描述了在不牺牲层质量的前提下,用于在Si上将直径从4英寸扩大到6英寸,在CdZnTe上从4 cm×4厘米扩大到8 cm×8 cm的不同技术工具。 Si和CdZnTe衬底上的单色HgCdTe层和单色HgCdTe层均具有极高的成分均匀性和低宏观缺陷密度。最后,包括检测器和焦平面阵列结果的一些示例,以突出显示外延层的高成分均匀性和均匀低宏观缺陷密度在获得单色和双色焦平面中的高可操作性和低簇故障方面的重要性。阵列(FPA)。

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