首页> 外文期刊>Journal of Crystal Growth >Atomic-level in situ real-space observation of Ga adatoms on GaAs(0 0 1)(2  ×4)-As surface during molecualr bemam epitaxy growth
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Atomic-level in situ real-space observation of Ga adatoms on GaAs(0 0 1)(2  ×4)-As surface during molecualr bemam epitaxy growth

机译:分子束外延生长过程中GaAs(0 0 1)(2×4)-As表面Ga原子的原子级原位实空间观测

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摘要

We study in situ scanning tunneling microscopy (STM) observations of Ga adatoms on the molecular beam epitaxy (MBE) growht front, GaAs(0 0 1)(2×4)-As surface, with a system in which STM and MBE are completely one. It is found that Ga adatoms are self-organized about one unit cell far from the B-step edge and on a missing dimmer row. Moreover, the three Ga adatoms form a trigonal surface structure. And this trigonal changed to a tetragonal strucutre with the addition of one Ga atiom.
机译:我们研究了Ga原子在分子束外延(MBE)生长前沿,GaAs(0 0 1)(2×4)-As表面上的原位扫描隧道显微镜(STM)观察结果,并且系统中STM和MBE完全一。研究发现,Ga原子是自组织的,自B阶边缘起离一个单位晶胞很近,位于丢失的调光器行上。而且,三个Ga原子构成三角形表面结构。加上一个Ga比例,这个三角形变成了一个方形结构。

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