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首页> 外文期刊>Journal of Crystal Growth >Molecular beam deposition of thin films of organick semiconductors
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Molecular beam deposition of thin films of organick semiconductors

机译:有机半导体薄膜的分子束沉积

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摘要

The ultra-high vacuum technique of organic moleculr beam deposition (OMBD) has been recently proved to provdie a very good method for growing highly controlled thin films of organic semiconductors. The approximate ordering of a crystalline layer to a subsrate, also called quasi-epitaxy, can be achieved with aproper choice of substrte and deposition conditions. Poly- and oligo-thiophenes are among the most interesting and widely studied organic semiconductors for applications in electronic and photonic devices, thanks to their high carrier mobiltiy and large nonlinear opticla response, combined with an exceptionally high flexibility of molecular engineering. Here, the deposition and the main properties of films of substituted sexithiophene molecules (6T) obtained by OMBD are discussed on the basis of X-ray diffraction and optical absorption measurements.
机译:最近已证明,有机分子束沉积(OMBD)的超高真空技术为生长高度受控的有机半导体薄膜提供了一种非常好的方法。通过适当选择基体和沉积条件,可以实现晶体层与基体的近似排序,也称为准外延。聚噻吩和低聚噻吩由于其高载流子迁移率和大的非线性光学响应,以及分子工程学的极高灵活性,是用于电子和光子设备的最受关注和广泛研究的有机半导体。在此,基于X射线衍射和光吸收测量,讨论了由OMBD获得的取代的六噻吩分子(6T)的膜的沉积和主要性能。

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