首页> 外文期刊>Journal of Crystal Growth >Stress and misoriented area formaion under large silicon carbide boule growth
【24h】

Stress and misoriented area formaion under large silicon carbide boule growth

机译:大型碳化硅晶锭生长下的应力和取向不正确的区域形成

获取原文
获取原文并翻译 | 示例
       

摘要

The presence of slightly misoriented (less than 1 deg) comparativley large areas in silicon carbide boules grown by teh sublimaion method is one of the types of defects which can limit the operation of devices based upon such material. 6H- and 4H-SiC boules were grown by the modified Lely metho elaborated at the St.-Peersburg Electrotechnical University. formation of stress and misoriented areas in SiC crsytals has been investigated. Nondesructie technqieus for such materila characterization have been developed.
机译:通过升华方法生长的碳化硅圆棒中存在一些方向不正确(小于1度)的比较大的区域,这是会限制基于这种材料的设备运行的缺陷类型之一。 6H和4H-SiC球团是通过在圣彼德斯堡电工大学制作的改良的Lely方法生长的。已经研究了SiC晶闸管中应力的形成和取向不正确的区域。已经开发了用于此类材料表征的非描述性技术。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号