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High-temperature slow crack growth of silicon carbide determined by constant-stress-rate and constant-stress testing

机译:通过恒应力率和恒应力测试确定碳化硅的高温缓慢裂纹扩展

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High-temperature slow-crack-growth behaviour of hot-pressed silicon carbide was determined using both constant-stress-rate ("dynamic fatigue") and constant-stress ("static fatigue") testing in flexure at 1300 degrees C in air. Slow crack growth was found to be a governing mechanism associated with failure of the material. Four estimation methods such as the individual data, the Weibull median, the arithmetic mean and the median deviation methods were used to determine the slow crack growth parameters. The four estimation methods were in good agreement for the constant-stress-rate testing with a small variation in the slow-crack-growth parameter, n, ranging from 28 to 36. By contrast, the variation in n between the four estimation methods was significant in the constant-stress testing with a somewhat wide range of n=16 to 32. (C) 1998 Chapman & Hall. [References: 19]
机译:使用恒定应力率(“动态疲劳”)和恒定应力(“静态疲劳”)在1300摄氏度的空气中进行弯曲试验,确定了热压碳化硅的高温缓慢裂纹生长行为。发现缓慢的裂纹扩展是与材料破坏相关的主导机制。采用四种估计方法,如个体数据,Weibull中位数,算术平均值和中位数偏差方法,确定慢速裂纹扩展参数。四种估算方法与恒定应力速率测试非常吻合,慢裂纹增长参数n的变化很小,范围从28到36。相比之下,四种估算方法之间n的变化为在恒压测试中具有重要意义,n = 16至32的范围较广。(C)1998 Chapman&Hall。 [参考:19]

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