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首页> 外文期刊>Journal of Crystal Growth >Three-dimensional instabilities in Czochralski process of crystal growth from silicon melt
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Three-dimensional instabilities in Czochralski process of crystal growth from silicon melt

机译:硅熔体晶体生长的直拉过程中的三维不稳定性

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This paper deals with axisymmetry breaking instabilities in Czochralski process of crystal growth from silicon melt (Prandtl number Pr = 0.01). Numerical 3D linear stability analysis was carried out on the axisymmetric bulk flow model. Stability diagram of critical Grashof numbers Gr_c dependent on aspect ratio α( = height/radius) in the range 0.4 ≤ α ≤ 1.0 was computed. Computations were carried out using the spectral element method in the meridional plane with Fourier decomposition in the azimuthal direction. It was found that convective instability sets in through an Hopf bifurcation displaying oscillations in time. Sensitivity of mode transitions was observed at parameter range of α > 0.65 and in some regions modes were observed approaching each other closely. Dangerous modes in the 0.65 < α ≤ 0.8 region were 2, 3, 4. For 0.4 ≤ α ≤ 0.85 dispersion relation analysis reveals convective instability effects while for larger α rotational effects appear. Analysis for the case of no heat convection (Pr = 0) was carried out showing different behavior for 0.4 ≤ α ≤ 0.85, thus, validating the analysis of Pr = 0.01.
机译:本文研究了硅熔体晶体生长在切克劳斯基过程中的轴对称破坏不稳定性(普朗特数Pr = 0.01)。在轴对称整体流模型上进行了数值3D线性稳定性分析。计算了在0.4≤α≤1.0范围内取决于纵横比α(=高度/半径)的Grashof临界值的稳定性图。在子午平面上使用频谱元素方法进行计算,并在方位角方向进行傅立叶分解。已经发现,对流不稳定性通过出现时间波动的霍普夫分叉而开始。在α> 0.65的参数范围内观察到模式转变的敏感性,并且在某些区域观察到模式彼此接近。在0.65 <α≤0.8范围内的危险模态分别为2、3、4。对于0.4≤α≤0.85的色散关系分析显示出对流不稳定性效应,而对于较大的α旋转效应出现。对没有热对流(Pr = 0)的情况进行了分析,结果表明在0.4≤α≤0.85时表现出不同的行为,因此验证了Pr = 0.01的分析。

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