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首页> 外文期刊>Journal of Crystal Growth >The effect of substrate temperature on filtered vacuum arc deposited zinc oxide and tin oxide thin films
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The effect of substrate temperature on filtered vacuum arc deposited zinc oxide and tin oxide thin films

机译:基板温度对过滤的真空电弧沉积的氧化锌和氧化锡薄膜的影响

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Zinc oxide (ZnO) and tin oxide (SnO_2) thin films were deposited on commercial microscope glass and UV-fused silica (UVFS) substrates using a filtered vacuum arc deposition (FVAD) system. During the deposition, the substrates temperature was kept at room temperature (RT) or at 400℃. The film structure, surface morphology, and composition were determined using X-ray diffraction (XRD), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS), respectively. The XRD patterns of the ZnO films deposited on RT substrates contained lines of strong c-axis orientation, whereas the intensity of the XRD lines of ZnO films deposited on 400℃ substrates was significantly stronger. The XRD patterns of SnO_2 films deposited on RT substrates did not contain any diffraction lines, indicating an amorphous film structure, whereas the XRD patterns of SnO_2 films deposited on hot substrates contained diffraction lines indicating that the films are polycrystalline. The ZnO and SnO_2 film thickness was in the range 100-363 nm. The surface roughness (RMS) of ZnO film was 1.3 nm at RT and increased to 5 nm at 400℃, whereas that of SnO_2 films was 1.5 nm and decreased to 0.5 nm at RT and at 400℃, respectively. The films' optical constants in the 250-1100 nm wavelength range were determined by variable angle spectroscopic ellipsometry and by transmission measurements. The peak transmission of the ZnO and SnO_2 films in the VIS was 80-90%. The refractive index n of the films deposited on RT and hot substrates were in the range 1.72-2.23 for ZnO samples, and in the range 1.87-2.20 for SnO_2 samples, as function of wavelength. The extinction coefficient of all films in the VIS was in the range 0.001 to 0.05, depending on wavelengths and deposition parameters. The optical band gap (E_g) was determined from the dependence of the absorption coefficient on the photon energy at short wavelengths. Depending on the deposition conditions, the values of E_g of ZnO and SnO_2 were in the range 3.25-3.30 and 3.60-3.98 eV, respectively.
机译:使用过滤的真空电弧沉积(FVAD)系统将氧化锌(ZnO)和氧化锡(SnO_2)薄膜沉积在商用显微镜玻璃和UV熔融二氧化硅(UVFS)基板上。在沉积过程中,基板温度保持在室温(RT)或400℃。分别使用X射线衍射(XRD),原子力显微镜(AFM)和X射线光电子能谱(XPS)确定膜的结构,表面形态和组成。 RT衬底上沉积的ZnO膜的XRD图案包含强c轴取向的线,而400℃衬底上沉积的ZnO膜的XRD线的强度则明显增强。沉积在RT基板上的SnO_2膜的XRD图谱不包含任何衍射线,表明非晶膜结构,而沉积在热基板上的SnO_2膜的XRD图谱包含衍射线,表明该膜为多晶。 ZnO和SnO_2的膜厚在100-363 nm之间。 ZnO薄膜的表面粗糙度(RMS)在室温下为1.3 nm,在400℃下增加至5 nm,而SnO_2薄膜的表面粗糙度在室温下和400℃下分别为1.5 nm和降低至0.5 nm。膜在250-1100 nm波长范围内的光学常数通过可变角度光谱椭圆偏振法和透射率测量来确定。 VIS中ZnO和SnO_2薄膜的峰值透射率为80-90%。作为波长的函数,沉积在RT和热基板上的薄膜的折射率n对于ZnO样品为1.72-2.23,对于SnO_2样品为1.87-2.20。根据波长和沉积参数,VIS中所有薄膜的消光系数在0.001至0.05的范围内。根据吸收系数对短波长光子能量的依赖性来确定光学带隙(E_g)。根据沉积条件,ZnO和SnO_2的E_g值分别在3.25-3.30和3.60-3.98 eV的范围内。

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