首页> 外文期刊>Journal of Crystal Growth >Misoriented domain formation in 6H-SiC single crystal
【24h】

Misoriented domain formation in 6H-SiC single crystal

机译:6H-SiC单晶中取向错误的畴形成

获取原文
获取原文并翻译 | 示例
           

摘要

6H-SiC single crystals were grown by the physical vapor transport (PVT) technique. Misoriented domains (MDs) were observed in as-grown crystals. Raman spectra and X-ray diffraction indicated that the MDs are 4H polytype with either (1012) or (1016) growth plane. Formation probability of MDs increased continuously as the thermal insulator had been repeatedly used. Simulations based on heat transfer demonstrated that the changes of the temperature and the temperature axial gradient at the center of the growth front were responsible for the phenomenon. The formation mechanism was put forward in terms of atomic structure of various crystal planes.
机译:通过物理气相传输(PVT)技术生长6H-SiC单晶。在生长的晶体中观察到取向错误的域(MDs)。拉曼光谱和X射线衍射表明MD是具有(1012)或(1016)生长平面的4H多型。由于重复使用了绝热材料,MD的形成概率持续增加。基于传热的模拟表明,温度的变化和生长前沿中心处的温度轴向梯度是造成这种现象的原因。针对各种晶面的原子结构,提出了形成机理。

著录项

  • 来源
    《Journal of Crystal Growth》 |2009年第14期|3573-3576|共4页
  • 作者单位

    Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China Graduate School of the Chinese Academy of Sciences, Beijing 100049, China;

    Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China Graduate School of the Chinese Academy of Sciences, Beijing 100049, China;

    Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China;

    Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China Graduate School of the Chinese Academy of Sciences, Beijing 100049, China;

    Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China;

    Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Computer simulation; A1. Defects; A2. Single crystal growth; B2. Semiconducting materials;

    机译:A1。计算机仿真;A1。缺陷;A2。单晶生长;B2。半导体材料;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号