NdSrNi_(0.8)Cu_(0.2)O_(4-δ) thin films epitaxially grown by pulsed laser deposition on LaAlO_3 and SrTiO_3: A potential electrode for epitaxial regrowth of perovskite structure-based oxides

摘要

NdSrNi_(0.8)Cu_(0.2)O_(4-δ) (NSNCO) thin films were grown by pulsed laser deposition (PLD) on LaAlCb and (110)SrTiO_3 substrates. NSNCO thin films were (0 01) and (103) oriented on (100) LaAlO_3 and (110)SrTiO_3, respectively, as evidenced by the θ-2θ X-ray diffraction. The high crystalline quality was illustrated by low value of rocking curve (△ω=0.1-0.5° for (001) films and about 1° for (103) films). In-plane ordering was probed by X-ray diffraction φ-scans, evidencing the epitaxial growth on both substrates. The microstructure of films investigated by scanning electron microscopy was strongly influenced by deposition conditions. Four probe electrical resistivity measurements were performed versus temperature in the range 77-300 K. The resistivity was found to be 0.004Ω cm at room temperature. Some bilayers combining a ferroelectric oxide and NSNCO, i.e. SrBi_2Nb_2O_9 (SBN) and NdSrNi_(0.8)Cu_(0.2)O_(4-δ), were grown by PLD on both substrates. The possibility to control (001)- and (116)-oriented epitaxial SBN thin films was proved by the X-ray diffraction analysis.